2 November 2000 Micropinch x-ray source and its applications
Author Affiliations +
An experimental model of an industrial micropinch x-ray source is described on the basis of a low inductance vacuum spark. It was designed and tested for applications in x-ray lithography, x-ray microscopy, surface processing (micro-relief leveling) and structural modification of thin dielectric layers. The error analysis of proximity method and test results confirmed the adequacy of its application to produce microchips for the microelectronic industry with spatial resolution of < 0.1 (mu) . The x-ray microscopy of human and rabbit blood and tissue cells was performed using the proximity shadow printing method with the sensitive polymer detectors or resists.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoliy E. Gurey, Anatoliy E. Gurey, Oleg G. Semyonov, Oleg G. Semyonov, Adolf A. Tikhomirov, Adolf A. Tikhomirov, } "Micropinch x-ray source and its applications", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); doi: 10.1117/12.405902; https://doi.org/10.1117/12.405902


Low energy repetitive plasma focus based neon soft x ray...
Proceedings of SPIE (September 05 2014)
Impulse through-target x-ray tube spectrum
Proceedings of SPIE (July 30 2002)
High-power laser-plasma x-ray source for lithography
Proceedings of SPIE (July 01 2002)
The Plasma Focus As Soft X Ray Source For Microscopy...
Proceedings of SPIE (November 27 1989)
High-aspect-ratio structure formation in x-ray lithography
Proceedings of SPIE (October 20 2000)
Ultraviolet And X-Ray Lithography
Proceedings of SPIE (November 09 1981)

Back to Top