2 November 2000 Micropinch x-ray source and its applications
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An experimental model of an industrial micropinch x-ray source is described on the basis of a low inductance vacuum spark. It was designed and tested for applications in x-ray lithography, x-ray microscopy, surface processing (micro-relief leveling) and structural modification of thin dielectric layers. The error analysis of proximity method and test results confirmed the adequacy of its application to produce microchips for the microelectronic industry with spatial resolution of < 0.1 (mu) . The x-ray microscopy of human and rabbit blood and tissue cells was performed using the proximity shadow printing method with the sensitive polymer detectors or resists.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoliy E. Gurey, Anatoliy E. Gurey, Oleg G. Semyonov, Oleg G. Semyonov, Adolf A. Tikhomirov, Adolf A. Tikhomirov, "Micropinch x-ray source and its applications", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); doi: 10.1117/12.405902; https://doi.org/10.1117/12.405902


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