Multilayer x-ray optics for energies E > 8 keV and their application in x-ray analysis

Reiner Dietsch; Stefan Braun; Thomas Holz; Hermann Mai; Roland Scholz; Lutz Bruegemann

doi:10.1117/12.405887

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2 November 2000 Multilayer x-ray optics for energies E > 8 keV and their application in x-ray analysis

Reiner Dietsch; Stefan Braun; Thomas Holz; Hermann Mai; Roland Scholz; Lutz Bruegemann

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Proceedings Volume 4144, Advances in Laboratory-based X-Ray Sources and Optics; (2000) https://doi.org/10.1117/12.405887
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Performance of Ni/C, Ni/B₄C, Mo/B₄C and W/B₄C multilayers in the energy range E > 8 keV is considered by simulation of x-ray reflectivity and resolution of 1st order Bragg reflection at three different photon energies. The results indicate, that Ni/C and Ni/B₄C multilayers show highest theoretical reflectivities of R > 80% for Cu K(alpha) - radiation and also above the Mo K-edge (E equals 20.04 keV) at 30 keV. For Mo K(alpha) -radiation a reflectivity of R > 90% can be achieved by the use of Mo/B₄C multilayers. For applications, where period thicknesses d < 3 nm and high reflectivities are required W/B₄C multilayers can be used. Theoretical values are compared with X-ray reflectometry results, which were executed at 75 period Ni/C, Ni/B₄C and Mo/B₄C multilayers, fabricated by pulsed laser deposition (PLD) technology on Si substrates. Amorphous or nanocrystalline structures of single layers, smoothest interfaces and high reproducibility of single layer thickness across the entire layer stack are the results of this high precision PLD process.

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Reiner Dietsch, Stefan Braun, Thomas Holz, Hermann Mai, Roland Scholz, and Lutz Bruegemann "Multilayer x-ray optics for energies E > 8 keV and their application in x-ray analysis", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405887

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