5 January 2001 Controlling thin film thickness distribution in two dimensions
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Abstract
We present the results of theoretical calculations pertaining to the control of the film thickness distribution in two dimensions. The calculations are relevant to magnetron sputter deposition in which two different deposition geometries are considered. One of which is for an 'in-line' system where the substrate passes along a linear path in front of each target, and the other for cylindrical deposition geometry where the substrates are mounted on a rotating drum. Results of various thickness gradients on flat as well as spherical and cylindrical substrates are shown. The thickness distribution in one dimension is controlled by the use of a contoured shield which appropriately intercepts sputtered material between the target and substrate. The film thickness in the other dimension is controlled by changing the velocity of the substrate through the deposition region. The shield contour and velocity profile required to achieve these gradients are also given.
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David M. Broadway, David M. Broadway, Michael D. Kriese, Michael D. Kriese, Yuriy Ya. Platonov, Yuriy Ya. Platonov, } "Controlling thin film thickness distribution in two dimensions", Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); doi: 10.1117/12.411623; https://doi.org/10.1117/12.411623
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