5 January 2001 High-resolution multilayer x-ray optics
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Presently there is a gap in energy resolution (Delta) E/E between a few percent for multilayer x-ray optics and a few 10-4 for perfect crystal optics. One approach to bridge this gap is the development of high-resolution multilayers. We will report on recent advances in this field and discuss both the capabilities and the limitations of this solution. The deposition of hundreds of layers of hard materials is a considerable challenge for the coating system, and stability issues have to be considered with particular care. We have shown theoretically and experimentally that this challenge can be met with a combination of Al2O3 and B4C. With 680 bilayers we reached a spectral resolution < 0.3% and a peak reflectivity of almost 50% for 12 keV x- rays. The disagreement with the diffraction properties of a perfect multilayer system could be accurately described by instabilities during the deposition process. With improved stability, such systems can provide still better performances.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Morawe, Christian Morawe, Jean-Christophe Peffen, Jean-Christophe Peffen, Eric Ziegler, Eric Ziegler, Andreas K. Freund, Andreas K. Freund, "High-resolution multilayer x-ray optics", Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); doi: 10.1117/12.411658; https://doi.org/10.1117/12.411658


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