PROCEEDINGS VOLUME 4146
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY | 30 JULY - 4 AUGUST 2000
Soft X-Ray and EUV Imaging Systems
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY
30 July - 4 August 2000
San Diego, CA, United States
Design and Manufacturing of UV and EUV Imaging Systems
Proc. SPIE 4146, DUV or EUV: that is the question, 0000 (8 November 2000); https://doi.org/10.1117/12.406659
Proc. SPIE 4146, Trends in optical design of projection lenses for UV and EUV lithography, 0000 (8 November 2000); https://doi.org/10.1117/12.406667
Proc. SPIE 4146, Illumination optics design for EUV lithography, 0000 (8 November 2000); https://doi.org/10.1117/12.406673
Proc. SPIE 4146, Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology, 0000 (8 November 2000); https://doi.org/10.1117/12.406674
Proc. SPIE 4146, Present status of the ASET at-wavelength phase-shifting point diffraction interferometer, 0000 (8 November 2000); https://doi.org/10.1117/12.406675
EUV/Soft X-Ray Multilayer and Reflectometry
Proc. SPIE 4146, Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability, 0000 (8 November 2000); https://doi.org/10.1117/12.406676
Proc. SPIE 4146, Multilayer reflectance during exposure to EUV radiation, 0000 (8 November 2000); https://doi.org/10.1117/12.406677
Proc. SPIE 4146, Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence, 0000 (8 November 2000); https://doi.org/10.1117/12.406660
EUV Sources
Proc. SPIE 4146, Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry, 0000 (8 November 2000); https://doi.org/10.1117/12.406661
Proc. SPIE 4146, Portable diagnostics for EUV light sources, 0000 (8 November 2000); https://doi.org/10.1117/12.406663
Proc. SPIE 4146, Compact debris shutter design of a laser-produced plasma source for high-NA application, 0000 (8 November 2000); https://doi.org/10.1117/12.406664
Proc. SPIE 4146, Optical layout of BACH: a beamline for advanced dichroism at Elettra, 0000 (8 November 2000); https://doi.org/10.1117/12.406665
Applications of EUV and Soft X-ray Imaging
Proc. SPIE 4146, High-precision measurements of the groove density of diffraction gratings, 0000 (8 November 2000); https://doi.org/10.1117/12.406666
Proc. SPIE 4146, Optimization of air gap for two-dimensional imaging system using synchrotron radiation, 0000 (8 November 2000); https://doi.org/10.1117/12.406668
Proc. SPIE 4146, Varied-line-spacing laminar-type holographic grating for the standard soft x-ray flat-field spectrograph, 0000 (8 November 2000); https://doi.org/10.1117/12.406669
EUV/Soft X-Ray Multilayer and Reflectometry
Proc. SPIE 4146, Si-based multilayers with high thermal stability, 0000 (8 November 2000); https://doi.org/10.1117/12.406670
Applications of EUV and Soft X-ray Imaging
Design and Manufacturing of UV and EUV Imaging Systems
Proc. SPIE 4146, XM-1: the high-resolution soft x-ray microscope at the Advanced Light Source, 0000 (8 November 2000); https://doi.org/10.1117/12.406672
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