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8 November 2000 Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence
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Abstract
A method of designing multilayers with broadband wavelength responses for use as coatings in EUV optics at normal incidence is presented int his paper. The method is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. This allows the design of multilayers for specific requirements. The method was used to design Mo/Si multilayers with broadband wavelength responses for the EUV region, 18 - 20 nm. Such mirrors were made by magnetron sputtering in 99.99% pure argon. The deposition rates, after calibration, were 0.12 nms-1 for molybdenum and 0.07 nms-1 for silicon. The broadband multilayers were deposited on 30 mm diameter K9 glass substrates with rms surface roughnesses less than 0.8 nm.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhanshan Wang, Changjun Kun, Yueying Ma, Bin Chen, Jianlin Cao, Zhuying Zhou, Xingdan Chen, and Alan G. Michette "Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406660
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