8 November 2000 Extreme-ultraviolet source development: a comparison of different concepts
Author Affiliations +
We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik. Friedrich- Schiller Universitat Jena, Max-Born Institut Berlin, and Gustav August Universitat Gottingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guido Schriever, Guido Schriever, Manfred Rahe, Manfred Rahe, Ulrich Rebhan, Ulrich Rebhan, Dirk Basting, Dirk Basting, Wojciech J. Walecki, Wojciech J. Walecki, Hans Lauth, Hans Lauth, Rainer Lebert, Rainer Lebert, Klaus Bergmann, Klaus Bergmann, Dieter Hoffmann, Dieter Hoffmann, Oliver Rosier, Oliver Rosier, Willi Neff, Willi Neff, Reinhart Poprawe, Reinhart Poprawe, Roland A. Sauerbrey, Roland A. Sauerbrey, H. Schwoerer, H. Schwoerer, S. Duesterer, S. Duesterer, C. Ziener, C. Ziener, Peter Viktor Nickles, Peter Viktor Nickles, H. Stiehl, H. Stiehl, Ingo Will, Ingo Will, Wolfgang Sandner, Wolfgang Sandner, Guenther A. Schmahl, Guenther A. Schmahl, Dietbert M. Rudolph, Dietbert M. Rudolph, "Extreme-ultraviolet source development: a comparison of different concepts", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406662; https://doi.org/10.1117/12.406662

Back to Top