8 November 2000 Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology
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Abstract
In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Udo Dinger, Udo Dinger, Frank Eisert, Frank Eisert, Holger Lasser, Holger Lasser, Maximilian Mayer, Maximilian Mayer, A. Seifert, A. Seifert, Guenther Seitz, Guenther Seitz, Siegfried Stacklies, Siegfried Stacklies, Franz-Josef Stickel, Franz-Josef Stickel, Martin Weiser, Martin Weiser, } "Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406674; https://doi.org/10.1117/12.406674
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