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8 November 2000 Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology
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Abstract
In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Udo Dinger, Frank Eisert, Holger Lasser, Maximilian Mayer, A. Seifert, Guenther Seitz, Siegfried Stacklies, Franz-Josef Stickel, and Martin Weiser "Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406674
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