8 November 2000 Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability
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Abstract
High performance reflective coatings for EUVL projection systems can be produced by using e-beam evaporation in combination with ion beam smoothening of the interfaces. Using this technique, we recently demonstrated a near normal incidence reflectivity of 69.5%. Another, equally important part of the optimization of the coating process is the lateral control of the thickness of the layers, that is the d-spacing of the coating. In this paper we demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/- 0.05% over a 6' area, both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance). All reflectance measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin.
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Eric Louis, Eric Louis, Andrey E. Yakshin, Andrey E. Yakshin, Peter C. Goerts, Peter C. Goerts, Sebastian Oestreich, Sebastian Oestreich, Edward L. G. Maas, Edward L. G. Maas, M. J. H. Kessels, M. J. H. Kessels, Detlef Schmitz, Detlef Schmitz, Frank Scholze, Frank Scholze, Gerhard Ulm, Gerhard Ulm, Stefan Muellender, Stefan Muellender, Markus Haidl, Markus Haidl, Fred Bijkerk, Fred Bijkerk, } "Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406676; https://doi.org/10.1117/12.406676
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