Multilayer reflectance during exposure to EUV radiation

Sebastian Oestreich; Roman Klein; Frank Scholze; Jeroen Jonkers; Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Gerhard Ulm; Markus Haidl; Fred Bijkerk

doi:10.1117/12.406677

8 November 2000 Multilayer reflectance during exposure to EUV radiation

Sebastian Oestreich, Roman Klein, Frank Scholze, Jeroen Jonkers, Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Gerhard Ulm, Markus Haidl, Fred Bijkerk

Author Affiliations +

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406677
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Mo/S multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm² were applied at the PB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3 X 10^-8 mbar (without hydrocarbons) and 10^-7 mbar (with hydrocarbons) at EUV intensities of 3 mW/mm², respectively 0.2 mW/mm² have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using UV produced ozone from air at atmospheric pressure, were performed and show that Mo/S mirrors do not suffer from prolonged exposure to ozone.

Citation Download Citation

Sebastian Oestreich, Roman Klein, Frank Scholze, Jeroen Jonkers, Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Gerhard Ulm, Markus Haidl, and Fred Bijkerk "Multilayer reflectance during exposure to EUV radiation", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406677

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