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3 October 2000 Recent advances in holographic materials from Slavich
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Proceedings Volume 4149, Holography 2000; (2000) https://doi.org/10.1117/12.402462
Event: Holography 2000, 2000, St. Poelton, Austria
Abstract
A general review of the current holographic materials available from the Micron Plant at AO Slavich is presented. In particular certain improvements to the technical parameters of the materials PFG-01 and PFG-03M (notably sensitivity) and PFG-03C (diffraction efficiency) are introduced. Likewise the introduction of a new 190 micron TAC film substrate for the PFG-01, PFG-03M, PFG-03C and VRP- M emulsions will be mentioned and examples of holograms produced on these emulsions will be shown. Various reflection hologram color control techniques are briefly discussed. Recommended chemistries that may be employed with each of the Slavich materials will be discussed in the context of Pulsed and CW radiation sources. A new VRP-3 developer recipe suitable for VRP=M will be introduced. Finally, contact copying using the PFG-01 and PFG-03M materials will be briefly mentioned.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stanislovas J. Zacharovas, David B. Ratcliffe, Gleb R. Skokov, Sergey P. Vorobyov, Petr I. Kumonko, and Yury A. Sazonov "Recent advances in holographic materials from Slavich", Proc. SPIE 4149, Holography 2000, (3 October 2000); https://doi.org/10.1117/12.402462
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