11 August 2000 Characterization and design optimization for CMOS-compatible MEMS
Author Affiliations +
Proceedings Volume 4175, Materials and Device Characterization in Micromachining III; (2000) https://doi.org/10.1117/12.395605
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
A new study of characterizing the mechanical properties of the most used CMOS (Complementary Metal Oxide Semiconductor) materials and how to optimize design variables has revealed a convenient method that could be easily applied for many other micro-electro-mechanical device design and fabrication processes. In general thin film material properties are highly process dependent and are strictly connected to the final performance of some devices. While most micro-device designers do perform calculation to some extent before submitting their design to real fabrication process in order to have the accuracy and precision of the calculation is the input set of constituent material parameters. Mechanical properties of thin films are sometimes unavailable from regular CMOS fabrication foundries where many CMOS compatible micro- devices are fabricated in batches. This paper proposed a design and analysis flow to extract the needed material properties by making simple structures using pilot processes at desired foundry service. As the pilot process results come out, varied material properties can be verified by comparing the experimental data and simulation of data of specially designed test keys. Some test key designs have been widely reported [1,2]. As many of the existing test key designs are only concentrating on one layer or two of thin film materials in the test structures, the proposed method could work out for multi-layers of thin film materials at the same time, which comes even closer to the practical needs of CMOS compatible MEMS.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tim K. Shia, Shih-I Yang, Cheng-Kuo Lee, Chih-Min Yao, and Mark H. Lee "Characterization and design optimization for CMOS-compatible MEMS", Proc. SPIE 4175, Materials and Device Characterization in Micromachining III, (11 August 2000); doi: 10.1117/12.395605; https://doi.org/10.1117/12.395605

Back to Top