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15 August 2000 Nano-spring arrays for high-density interconnect
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Proceedings Volume 4176, Micromachined Devices and Components VI; (2000)
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
A new type of compliant interconnect derived from a thin metal film fabricated with a controlled stress profile is being developed for flip- flop interconnects and probing devices. Interconnections have been demonstrated on lateral pitches as tight as 6 microns. The interconnect is highly elastic and can provide up to hundreds of microns of vertical compliance.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David K. Fork, Christopher L. Chua, Patrick Kim, Linda T. Romano, Rachel Lau, Lai Wong, Andrew Alimonda, Vicki Geluz, Mark Teepe, Joe Haemer, Mitul B. Modi, Qi Zhu, Dennis L. Ma, Suresh Sitaraman, Donald L. Smith, and Sammy Mok "Nano-spring arrays for high-density interconnect", Proc. SPIE 4176, Micromachined Devices and Components VI, (15 August 2000);

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