22 August 2000 Microsystems for diverse applications using recently developed microfabrication techniques
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Proceedings Volume 4178, MOEMS and Miniaturized Systems; (2000) https://doi.org/10.1117/12.396492
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
The continuous progress in micro- and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresistant processing and plating. The availibility of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Laurent Dellmann, Laurent Dellmann, Terunobu Akiyama, Terunobu Akiyama, Danick Briand, Danick Briand, Sebastien Gautsch, Sebastien Gautsch, Olivier T. Guenat, Olivier T. Guenat, Benedikt Guldimann, Benedikt Guldimann, Philippe Luginbuhl, Philippe Luginbuhl, Cornel Marxer, Cornel Marxer, Urs Staufer, Urs Staufer, Bart van der Schoot, Bart van der Schoot, Nico F. de Rooij, Nico F. de Rooij, } "Microsystems for diverse applications using recently developed microfabrication techniques", Proc. SPIE 4178, MOEMS and Miniaturized Systems, (22 August 2000); doi: 10.1117/12.396492; https://doi.org/10.1117/12.396492
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