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18 August 2000 Experimental realization of a diffractive optical isolator
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Proceedings Volume 4179, Micromachining Technology for Micro-Optics; (2000) https://doi.org/10.1117/12.395686
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
We report on the realization of an diffractive optical isolator for use at 543 nm by the combination of two binary high frequency gratings, corrugated into the surface of a quartz substrate. A single-order grating acts as a polarizing beam splitter with a measured diffraction efficiency of greater 95%. The other grating is a zero-order diffraction with 290 nm period and 1300 nm depth, acting as a quarterwave plate for conical incidence. A good correlation between theoretical and experimental results is demonstrated.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tilman Glaser, Siegmund Schroeter, Hartmut Bartelt, Hans-Joerg Fuchs, and Ernst-Bernhard Kley "Experimental realization of a diffractive optical isolator", Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); https://doi.org/10.1117/12.395686
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