Fabrication technologies for micro-optical elements with arbitrary surfaces

Andreas Schilling; Philippe Nussbaum; Irene Philipoussis; Hans Peter Herzig; Laurent Stauffer; Markus Rossi; Ernst-Bernhard Kley

doi:10.1117/12.395692

18 August 2000 Fabrication technologies for micro-optical elements with arbitrary surfaces

Andreas Schilling, Philippe Nussbaum, Irene Philipoussis, Hans Peter Herzig, Laurent Stauffer, Markus Rossi, Ernst-Bernhard Kley

Author Affiliations +

Proceedings Volume 4179, Micromachining Technology for Micro-Optics; (2000) https://doi.org/10.1117/12.395692
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States

Abstract

We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of different elements in order to quantify the performance of the different technologies. We found that higher effencies can be achieved with refractive type elements, while precise deflection angles can be obtained more easily with diffractive elements.

Citation Download Citation

Andreas Schilling, Philippe Nussbaum, Irene Philipoussis, Hans Peter Herzig, Laurent Stauffer, Markus Rossi, and Ernst-Bernhard Kley "Fabrication technologies for micro-optical elements with arbitrary surfaces", Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); https://doi.org/10.1117/12.395692

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