18 August 2000 Fabrication technologies for micro-optical elements with arbitrary surfaces
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Proceedings Volume 4179, Micromachining Technology for Micro-Optics; (2000) https://doi.org/10.1117/12.395692
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of different elements in order to quantify the performance of the different technologies. We found that higher effencies can be achieved with refractive type elements, while precise deflection angles can be obtained more easily with diffractive elements.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Schilling, Andreas Schilling, Philippe Nussbaum, Philippe Nussbaum, Irene Philipoussis, Irene Philipoussis, Hans Peter Herzig, Hans Peter Herzig, Laurent Stauffer, Laurent Stauffer, Markus Rossi, Markus Rossi, Ernst-Bernhard Kley, Ernst-Bernhard Kley, "Fabrication technologies for micro-optical elements with arbitrary surfaces", Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); doi: 10.1117/12.395692; https://doi.org/10.1117/12.395692

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