18 August 2000 Microsystems for diverse applications using recently developed microfabrication techniques
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Proceedings Volume 4179, Micromachining Technology for Micro-Optics; (2000) https://doi.org/10.1117/12.395691
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
The continuous progress in micro- and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresistant processing and plating. The availibility of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.
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Laurent Dellmann, Terunobu Akiyama, Danick Briand, Sebastien Gautsch, Olivier T. Guenat, Benedikt Guldimann, Philippe Luginbuhl, Cornel Marxer, Urs Staufer, Bart van der Schoot, Nico F. de Rooij, "Microsystems for diverse applications using recently developed microfabrication techniques", Proc. SPIE 4179, Micromachining Technology for Micro-Optics, (18 August 2000); doi: 10.1117/12.395691; https://doi.org/10.1117/12.395691
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