10 August 2000 Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures
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Proceedings Volume 4180, MEMS Reliability for Critical Applications; (2000) https://doi.org/10.1117/12.395698
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
Micro-Nano Technology Visualization (MNTV) is critical to studies in MEMS reliability. The ability to see and characterize the microstructures and interfaces with high resolution at the microscale and nanoscale is invaluable. In this paper we present the motivation, paradigm and examples of visualization techniques applied to several aspects of surface micromachined polysilicon structures. High resolution cross-section imaging, using both a FIB/SEM and FIB/STEM, is used to acquire information on profile differences between fabrication facilities and grain size and orientation. The AFM is used to compare surface roughness on both sides (top and bottom surfaces) of thin film polysilicon after release etching. The data gathered will be extremely useful feedback for fabrication facilities in terms of process characterization and quality assurance. The data will also be useful for MEMS CAD tools where device and process models must be validated.
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Russell A. Lawton, Russell A. Lawton, Gisela Lin, Gisela Lin, Joanne Wellman, Joanne Wellman, Leslie M. Phinney, Leslie M. Phinney, Jose Uribe, Jose Uribe, Edward Griffith, Edward Griffith, Ingrid De Wolf, Ingrid De Wolf, Eric Lawrence, Eric Lawrence, } "Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures", Proc. SPIE 4180, MEMS Reliability for Critical Applications, (10 August 2000); doi: 10.1117/12.395698; https://doi.org/10.1117/12.395698
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