18 August 2000 Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography
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Abstract
The AMAG comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advanced scanning electron microscope critical dimension measurement instrument (CD-SEM). This paper describes the result of an effort to benchmark six CD-SEM instruments according to this specification.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alain G. Deleporte, Alain G. Deleporte, John A. Allgair, John A. Allgair, Charles N. Archie, Charles N. Archie, G. William Banke, G. William Banke, Michael T. Postek, Michael T. Postek, Jerry E. Schlesinger, Jerry E. Schlesinger, Andras E. Vladar, Andras E. Vladar, Arnold W. Yanof, Arnold W. Yanof, "Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); doi: 10.1117/12.395750; https://doi.org/10.1117/12.395750
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