18 August 2000 Pattern placement errors: application of in-situ interferometer-determined Zernike coefficients in determining printed image deviations
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Abstract
Several ideas have recently been presented which attempt to measure and predict lens aberrations for new low k1 imaging systems. Abbreviated sets of Zernike coefficients have been produced and used to predict Across Chip Linewidth Variation. Empirical use of the wavefront aberrations can now be used in commercially available lithography simulators to predict pattern distortion and placement errors. Measurement and Determination of Zernike coefficients has been a significant effort of many. However the use of this data has generally been limited to matching lenses or picking best fit lense pairs. We will use wavefront aberration data collected using the Litel InspecStep in-situ Interferometer as input data for Prolith/3D to model and predict pattern placement errors and intrafield overlay variation. Experiment data will be collected and compared to the simulated predictions.
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William R. Roberts, Christopher J. Gould, Adlai H. Smith, Ken Rebitz, "Pattern placement errors: application of in-situ interferometer-determined Zernike coefficients in determining printed image deviations", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); doi: 10.1117/12.395748; https://doi.org/10.1117/12.395748
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