25 January 2001 Generation of nanosecond XeCl pulse trains
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Proceedings Volume 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (2001) https://doi.org/10.1117/12.414089
Event: XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 2000, Florence, Italy
Abstract
High contrast nanosecond pulse trains are produced by an oscillatorÑamplifier XeCl laser system incorporating polarizing optics. The device is simple and flexible allowing to deliver nanosecond pulse trains up to 17 mJ and with adjustable characteristics mainly concerning the number ofpulses (2 to 6 pulses) and the individual pulse peak power (0.2Ñ2.3 MW).
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olivier P. Uteza, Olivier P. Uteza, Christophe Bonneville, Christophe Bonneville, Philippe Ch. Delaporte, Philippe Ch. Delaporte, Bernard L. Fontaine, Bernard L. Fontaine, Marc L. Sentis, Marc L. Sentis, "Generation of nanosecond XeCl pulse trains", Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); doi: 10.1117/12.414089; https://doi.org/10.1117/12.414089
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