Translator Disclaimer
22 January 2001 ASIC data preparation management for OPC
Author Affiliations +
ASIC layout data, which can be large and typically with little hierarchy, can prove challenging for complex optical proximity correction (OPC) operations. Thoughtful coordination between the ASIC library designers and the OPC code developers in terms of design and execution methodologies can result in large savings in run time and additional hierarchy flattening with little or no impact to the library layout density. Results from such a collaboration on IBM’s 0.13um ASIC library resulted in better than order of magnitude improvement for gat e array library cell data preparation
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy G. Dunham and William C. Leipold "ASIC data preparation management for OPC", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001);


Implementation issues for production OPC
Proceedings of SPIE (August 24 1999)
Mask Industry Assessment: 2007
Proceedings of SPIE (October 22 2007)
TPS health monitoring on X-38
Proceedings of SPIE (June 08 1999)
Mask industry assessment: 2009
Proceedings of SPIE (September 29 2009)
Mask Industry Assessment: 2011
Proceedings of SPIE (October 13 2011)

Back to Top