22 January 2001 Eddy current evaluation for a high-resolution EB system
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Abstract
A semi-in-lens electron beam (EB) optical system improves the beam resolution. However, the eddy current is induced in the target and deviates the beam position when the stage is moving continuously. We calculated the eddy current distribution by approximating the magnetic field on the target to a Gaussian distribution. In the mask-scan EB column1 the maximum value and the dispersion of the magnetic field on the target are 0.01 T and 30 mm, respectively. The beam shift due to the eddy current flowing in the Cr film on a reticle is 1.5 X 10-11 m at the stage speed of 0.1 m/s. Therefore, the eddy current does not degrade the positional accuracy.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naoharu Shimomura, Naoharu Shimomura, Munehiro Ogasawara, Munehiro Ogasawara, Kiyoshi Hattori, Kiyoshi Hattori, Jun Takamatsu, Jun Takamatsu, Hitoshi Sunaoshi, Hitoshi Sunaoshi, Shusuke Yoshitake, Shusuke Yoshitake, Yuuji Fukudome, Yuuji Fukudome, Kiminobu Akeno, Kiminobu Akeno, } "Eddy current evaluation for a high-resolution EB system", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410723; https://doi.org/10.1117/12.410723
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