22 January 2001 New approach to improve CD uniformity based on mask quality
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Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001); doi: 10.1117/12.410673
Event: Photomask Technology, 2000, Monterey, CA, United States
Abstract
CD uniformity is one of the key discussion topics in the ramp-up process of new technologies. The impact of mask quality is getting more and more attention in this process. The paper presents improving wafer CD uniformity control by application of new reticle CD qualification procedure. The new procedure is based on combining conventional CD metrology and Linewidth Bias Monitor (LBM) as a standard part of mask inspection.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roman Liebe, Carmen Jaehnert, Gidon Gottlib, Yair Eran, Shirley Hemar, Amikam Sade, Anja Rosenbusch, "New approach to improve CD uniformity based on mask quality", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410673; https://doi.org/10.1117/12.410673
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