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22 January 2001 Subtractive defect repair via nanomachining
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Abstract
The roadmap to develop smaller and smaller critical dimensions on photomasks has predicated the need for new technologies that can facilitate the repair on a scale that to date has proven difficult to achieve by conventional repai tools. RAVE has developed a novel technology that has application for subtractive repair of defects at and belo the 130 nm design rule.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark R. Laurance "Subtractive defect repair via nanomachining", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410683
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