3 October 2000 Preparation and properties of titanium oxide thin film by midfrequency alternative reactive magnetron sputtering technique
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Proceedings Volume 4220, Advanced Photonic Sensors: Technology and Applications; (2000) https://doi.org/10.1117/12.401717
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China
Abstract
In this paper TiO2 thin film was successfully prepared by mid-frequency alternative reactive magnetron sputtering technique with pure titanium target. Ellipsometry, AES, SEM, XRD and ultraviolet spectrophotometer were used to examine the thickness and refractive index, composition, surface morphology, microstructure and ultraviolet and visible absorption spectrum of the TiO2 thin film, respectively. The effects of technological parameters on the properties of TiO2 thin film were studied. The experimental results showed that the ratio of O to Ti in the thin film is very close to 2:1, which is almost independent of the oxygen partial pressure under the experiment flow rate range of oxygen in the work. The microstructure of TiO2 thin film is mainly composed of anatase. The surface morphology of TiO2 thin film is fine and dense. The optical properties of TiO2 thin film are fairly good. Its transmittance is high up to 90%. The ultraviolet and visible absorption spectrum showed that the transmittance obviously decreased when oxygen flow rate was lowered from 10 sccm to 2 sccm.
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Yaqi Hou, Yaqi Hou, Daming Zhuang, Daming Zhuang, Daqing Zhao, Daqing Zhao, Jihong Zhang, Jihong Zhang, Chengbiao Wang, Chengbiao Wang, } "Preparation and properties of titanium oxide thin film by midfrequency alternative reactive magnetron sputtering technique", Proc. SPIE 4220, Advanced Photonic Sensors: Technology and Applications, (3 October 2000); doi: 10.1117/12.401717; https://doi.org/10.1117/12.401717
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