Paper
5 October 2000 Photoluminescence spectrum measurement of GaAs photocathode material
Hui Guo, Vitaly Pravdivtsev
Author Affiliations +
Proceedings Volume 4223, Instruments for Optics and Optoelectronic Inspection and Control; (2000) https://doi.org/10.1117/12.401782
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China
Abstract
The luminescence generation mechanism of semiconductor epitaxial structure and the basic principle of photoluminescence spectrum measuring instrument are outlined in this paper. Detailed method about how to make use of the instrument to measure the doping level and composition as well as the uniformity of GaAs/GaAlAs layer is described. In the end, the effect of these parameters on the function of the III-gen photocathode is discussed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hui Guo and Vitaly Pravdivtsev "Photoluminescence spectrum measurement of GaAs photocathode material", Proc. SPIE 4223, Instruments for Optics and Optoelectronic Inspection and Control, (5 October 2000); https://doi.org/10.1117/12.401782
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Luminescence

Gallium arsenide

Semiconductors

Doping

Photodiodes

Semiconducting wafers

Stereolithography

Back to Top