5 October 2000 Theoretical and experimental study of Cs 852-nm FADOF
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Proceedings Volume 4223, Instruments for Optics and Optoelectronic Inspection and Control; (2000) https://doi.org/10.1117/12.401772
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China
Abstract
In this paper, the theoretical model and experimental demonstration of Cs 852nm FADOF in weak and strong magnetic field are discussed. Whenthe FADOF system working under the weak field, the theoretical and experimental results are agreement with the previous repot. In the case of strong field, when performing condition is B equals 0.0883T, T equals 351K, the line-center operation is observed. The comparison between the theory and the experiment gives reasonably expected results.
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Yong Bi, Yong Bi, Yundong Zhang, Yundong Zhang, Xiaoling Jia, Xiaoling Jia, Qi L. Wang, Qi L. Wang, Zuguang Ma, Zuguang Ma, "Theoretical and experimental study of Cs 852-nm FADOF", Proc. SPIE 4223, Instruments for Optics and Optoelectronic Inspection and Control, (5 October 2000); doi: 10.1117/12.401772; https://doi.org/10.1117/12.401772
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