24 October 2000 Extensible TCAD optimization framework combining gradient-based and genetic optimizers
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Proceedings Volume 4228, Design, Modeling, and Simulation in Microelectronics; (2000); doi: 10.1117/12.405424
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
Our simulation environment for semiconductor technology analysis is a flexible, user programmable tool for optimization and inverse modeling of semiconductor devices. It is easily customizable through an interactive, object- oriented and functional scripting language. Dynamic load balancing enables to take advantage of a cluster of hosts with minimal requirements on the software infrastructure. Our approach combines the advantages of gradient based and evolutionary algorithm optimizers and the capability of finding global extrema and thus make unattended optimizations without guessing starting values possible.
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Clemens Heitzinger, Siegfried Selberherr, "Extensible TCAD optimization framework combining gradient-based and genetic optimizers", Proc. SPIE 4228, Design, Modeling, and Simulation in Microelectronics, (24 October 2000); doi: 10.1117/12.405424; https://doi.org/10.1117/12.405424
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KEYWORDS
Evolutionary algorithms

Optimization (mathematics)

TCAD

Computing systems

Nanoimprint lithography

Computer simulations

Genetics

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