20 October 2000 Optimization methodology for low-g microaccelerometer
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Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404894
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
This paper presents a single crystal silicon low-g open loop microaccelerometer designed and fabricated through a spreadsheet optimization methodology. The paper begins with the theoretical formulation and analysis of the differential capacitive accelerometer with full-scale measurement range of +/- 2 g and mg resolution. The `House of Quality' was then used to model and analyze the sensor design variables and device specifications qualitatively. The optimization was implemented using the Excel SolverTM and MATLAB. The effects of electrostatic spring constant on the natural frequency and sensitivity of the accelerometer have been thoroughly discussed. The ratiometric error for this system has been optimized and is well below 2% with a cross axis sensitivity of less than 3%. The operating voltage is 5 V DC. The construction is based on a hybrid two-chip design and the sensing element is wire bonded to a CMOS ASIC.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francis E.H. Tay, Xu Jun, V. J. Logeeswaran, "Optimization methodology for low-g microaccelerometer", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); doi: 10.1117/12.404894; https://doi.org/10.1117/12.404894

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