20 October 2000 Tools and processes for MEMS and nanotechnology
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Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404911
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
Research into Microelectromechanics (MEMS) and Nanotechnology covers the range of feature dimensions from submillimeter to nanometer scales. It relies upon tools and processes for lithography and pattern transfer drawn largely but not exclusively from the silicon semiconductor industry. Optical lithography systems, particle beam nanowriter tools and X-ray sources may be regarded as the `machine tools' for MEMS and Nanotechnology, each with their unique advantages and limitations. They are being exploited for R&D applications ranging from customized MEMS to vacuum microelectronics and novel nanotools such as electron microcolumns and multiple tip scanning probe systems.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philip D. Prewett, Syed Ejazu Huq, M. C. L. Ward, "Tools and processes for MEMS and nanotechnology", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); doi: 10.1117/12.404911; https://doi.org/10.1117/12.404911
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