Evaluation of an optical surface using nanometrology in optical manufacturing technology

Jianbai Li; Anqing Zhao; Xiaoyun Li; Xiaoli Zhang; Ming Wang

doi:10.1117/12.402847

6 October 2000 Evaluation of an optical surface using nanometrology in optical manufacturing technology

Jianbai Li, Anqing Zhao, Xiaoyun Li, Xiaoli Zhang, Ming Wang

Proceedings Volume 4231, Advanced Optical Manufacturing and Testing Technology 2000; (2000) https://doi.org/10.1117/12.402847
Event: International Topical Symposium on Advanced Optical Manufacturing and Testing Technology, 2000, Chengdu, China

Abstract

In this paper, a testing method for optical polished surface in level instrumentation using Atomic Force microscope (AFM) is presented, and some results reached to nanmometer RMS are listed. In the paper it is indicated that different size of polished platforms are formed as difference of optical polished method and period. This research has important significance for improving optical polishing technology and obtaining supersmooth polishing surface.

Citation Download Citation

Jianbai Li, Anqing Zhao, Xiaoyun Li, Xiaoli Zhang, and Ming Wang "Evaluation of an optical surface using nanometrology in optical manufacturing technology", Proc. SPIE 4231, Advanced Optical Manufacturing and Testing Technology 2000, (6 October 2000); https://doi.org/10.1117/12.402847

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