6 October 2000 Optimizing parameters for computer-controlled polishing precision planar mirror
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Proceedings Volume 4231, Advanced Optical Manufacturing and Testing Technology 2000; (2000) https://doi.org/10.1117/12.402791
Event: International Topical Symposium on Advanced Optical Manufacturing and Testing Technology, 2000, Chengdu, China
Abstract
A quantitative expression for mid-spatial frequency error of the large planar mirror fabricated by computer controlled polishing is employed in terms of wavefront's power spectral density (PSD). The PSD information is calculated from wavefront measured by large phase shifted interferometer. The optimized process parameters are investigated to reduce the mid-spatial frequency error with adequate efficiency to meet the conventional requirements such as P-V and RMS wavefront errors. Based on the criteria of efficiency and PSD, the optimized parameters have been obtained for fabricating precision planar mirror. As an application, a 270 mm x 270 mm x 30 mm mirror has been finished after 10 polishing hours. The P-V value of the reflective wavefront is 0.19 λ (λ= 0.6328μm), and the PSD distribution has also met the requirements.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qiao Xu, Qiao Xu, Jinm Wang, Jinm Wang, Jie Yu, Jie Yu, Fuxing Yang, Fuxing Yang, } "Optimizing parameters for computer-controlled polishing precision planar mirror", Proc. SPIE 4231, Advanced Optical Manufacturing and Testing Technology 2000, (6 October 2000); doi: 10.1117/12.402791; https://doi.org/10.1117/12.402791
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