2 November 2000 Pulsed laser deposition of titanium-based thin layers
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Complex examinations of the structure were performed on thin layers of metallic titanium, titanium nitride and titanium oxide deposited by the means of PLD using Nd:YAG laser. Influence of deposition parameters on the film morphology was under examination. The layers revealed a nano-structure of a good quality. Appearance of a new tetragonal Ti(N)- phase was sated in the deposition of titanium metallic in the reactive chamber with argon atmosphere. The TiN-phase was formed during deposition of titanium nitride, independently of nitrogen flow in the chamber. Transition of oxides from the Ti2-O via TiO to TiO2 was observed with increasing flow of oxygen in the chamber for deposition of titanium oxide. TEM examinations of microstructure within the cross-sections of layer revealed a micro-collumnar structure. All of the examined layers were characterised by a strong axial crystallographic preferred orientation which has been stated on the basis of the measured pole figures. The 001 axial texture was identified within the deposited metallic titanium for the Ti(N) tetragonal phase as well as for the TiO oxide, while the 111 texture was observed in the case of TiN nitride. Measurements of the residual stresses of the I-st order in the TiN phase using the X-ray sin2(psi) method, showed the stress level of -5000 to - 7000 Mpa. The residual stresses measured in the substrate of ferritic steel wer about of -150MPa.
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Boguslaw Major, Boguslaw Major, Reinhold Ebner, Reinhold Ebner, Grzegorz Kruzel, Grzegorz Kruzel, Waldemar Wolczynski, Waldemar Wolczynski, } "Pulsed laser deposition of titanium-based thin layers", Proc. SPIE 4238, Laser Technology VI: Applications, (2 November 2000); doi: 10.1117/12.405971; https://doi.org/10.1117/12.405971

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