Translator Disclaimer
29 June 2001 Comparison of microstructuring irradiated by 193-nm and 308-nm lasers
Author Affiliations +
Abstract
In this paper, the direct ablation of polymer films of PMMA, PI, PC and K9 glass has been studied at wavelengths of 193 nm and 308 nm. The ablation characteristics of microstructuring is mainly discussed and compared. The ablation qualities of PC, PMMA and K9 glass by XeCl (308 nm, 30 ns) excimer laser are very poor. The ablation performances of PMMA and K9 glass by ArF (193 nm, 17 ns) excimer laser are medium. Smooth surfaces and sharp edges with micron transverse resolution and submicron depth precision can be obtained by the ablation of PI at 308 nm, and PI, PC at 193 nm.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lin Zhang, Qihong Lou, Yunrong Wei, and Jingxing Dong "Comparison of microstructuring irradiated by 193-nm and 308-nm lasers", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432541
PROCEEDINGS
4 PAGES


SHARE
Advertisement
Advertisement
Back to Top