Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods

Jan Lancok; Miroslav Jelinek; Filip Vyslouzil; Martin Vrnata; Vladimir Myslik; Antonino Santoni; Ivano Menucucci

doi:10.1117/12.432542

29 June 2001 Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods

Jan Lancok, Miroslav Jelinek, Filip Vyslouzil, Martin Vrnata, Vladimir Myslik, Antonino Santoni, Ivano Menucucci

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432542
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

Tin oxide active layers were deposited by Pulsed Laser Deposition (PLD) and Laser assisted Chemical Vapor Deposition (LCVD) methods. The films were grown on the same substrate chips for the thin layer conductive sensor. Their chemical and morphological properties were studied in connection with gas sensor applications. The influence of the Pd catalyst was tested. The chemical composition was investigated by XPS analysis. A sensitivity to 1000 ppm of hydrogen of about 1090 for PLD and 5 for LCVD was achieved.

Citation Download Citation

Jan Lancok, Miroslav Jelinek, Filip Vyslouzil, Martin Vrnata, Vladimir Myslik, Antonino Santoni, and Ivano Menucucci "Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432542

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