29 June 2001 Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods
Author Affiliations +
Abstract
Tin oxide active layers were deposited by Pulsed Laser Deposition (PLD) and Laser assisted Chemical Vapor Deposition (LCVD) methods. The films were grown on the same substrate chips for the thin layer conductive sensor. Their chemical and morphological properties were studied in connection with gas sensor applications. The influence of the Pd catalyst was tested. The chemical composition was investigated by XPS analysis. A sensitivity to 1000 ppm of hydrogen of about 1090 for PLD and 5 for LCVD was achieved.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Lancok, Jan Lancok, Miroslav Jelinek, Miroslav Jelinek, Filip Vyslouzil, Filip Vyslouzil, Martin Vrnata, Martin Vrnata, Vladimir Myslik, Vladimir Myslik, Antonino Santoni, Antonino Santoni, Ivano Menucucci, Ivano Menucucci, } "Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432542; https://doi.org/10.1117/12.432542
PROCEEDINGS
4 PAGES


SHARE
Back to Top