ITO thin film fabrication assisted by the infrared free-electron laser

Masato Yasumoto; Akira Ishizu; Natsuro Tsubouchi; Kunio Awazu; Takio Tomimasu

doi:10.1117/12.432544

29 June 2001 ITO thin film fabrication assisted by the infrared free-electron laser

Masato Yasumoto, Akira Ishizu, Natsuro Tsubouchi, Kunio Awazu, Takio Tomimasu

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432544
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

We fabricated the ITO (In-Sn-O) thin film assisted by the infrared free electron laser (12.1 micron-meter-FEL). The novel method can in principle excite the vibration mode of the deposited molecules with matching the FEL energy and the molecular vibration-energy. The method thus is independent of the substrate temperature and has the advantage of fabrication on the low-temperature substrate. The ITO thin- film fabricated by the novel method preliminarily indicates similar transparency to one fabricated by the conventional method.

Citation Download Citation

Masato Yasumoto, Akira Ishizu, Natsuro Tsubouchi, Kunio Awazu, and Takio Tomimasu "ITO thin film fabrication assisted by the infrared free-electron laser", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432544

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