29 June 2001 Time-resolved study of femtosecond microfabrication in silica glass
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Abstract
We report investigation of light-induced damage threshold (LIDT) in purified silica (transmission band down to 160 nm) by 350 fs laser pulses at the wavelength of 795 nm and 498 nm. Focusing a single pulse by a high numeric aperture NA equals 1.35 microscope objective lens results in one of the lowest single-show bulk LIDT values reported so far, 5 J/cm2, while the surface ablation threshold is 2.5 J/cm2 with both values being well below the critical self-focusing power in silica. Furthermore, we report the peculiarities of damage by two-pulse irradiation (duration experimental data and numeric simulation, which takes into account optical free-carrier generation and relaxation, demonstrates that these processes can explain the measured self-focusing, super-continuum generation, and light-induced damage threshold values. We argue that use of high numeric aperture objective, despite substantial temporal pulse stretching, results in tight focusing which is capable of overcoming the beam self-focusing, and the resulting fabrication quality is comparable to that obtained using shorter pulses.
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Hiroaki Misawa, Saulius Juodkazis, Andrius Marcinkevicius, Mitsuru Watanabe, Vygantas Mizeikis, Shigeki Matsuo, "Time-resolved study of femtosecond microfabrication in silica glass", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432501; https://doi.org/10.1117/12.432501
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