Advanced defect-detection methods for CMP process modules in semiconductor manufacturing

J. Scott Steckenrider; Rick Foster; Sumit Guha; Younsoo Ra; Hawk Kim; Anantha Sethuraman

doi:10.1117/12.429353

5 June 2001 Advanced defect-detection methods for CMP process modules in semiconductor manufacturing

J. Scott Steckenrider, Rick Foster, Sumit Guha, Younsoo Ra, Hawk Kim, Anantha Sethuraman

Proceedings Volume 4275, Metrology-based Control for Micro-Manufacturing; (2001) https://doi.org/10.1117/12.429353
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

A comprehensive defect analysis scheme has been described here incorporating defect monitoring, classification and review tools. The integration scheme is presented pictorially, and described in detail in the body of this paper. This paper will also describe CMP defects gathered using this new defect detection methodology.

Citation Download Citation

J. Scott Steckenrider, Rick Foster, Sumit Guha, Younsoo Ra, Hawk Kim, and Anantha Sethuraman "Advanced defect-detection methods for CMP process modules in semiconductor manufacturing", Proc. SPIE 4275, Metrology-based Control for Micro-Manufacturing, (5 June 2001); https://doi.org/10.1117/12.429353

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