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15 May 2001 Photorefractive phase mask
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Proceedings Volume 4277, Integrated Optics Devices V; (2001)
Event: Symposium on Integrated Optics, 2001, San Jose, CA, United States
We propose and demonstrate a new method to fabricate volume phase mask in LiNbO3:Fe crystal by photorefractive effect, for the first time to our knowledge. First, we image an amplitude mask with corresponding intensity distribution at the incident face of a photorefractive LiNbO3:Fe crystal. After an exposure of proper time, due to photorefractive effect, the distribution of refractive index in the crystal is changed. Therefore we get the volume phase mask we want. The influence of the anisotropy of photorefractive nonlinearity on volume phase mask can be overcome by controlling experimental conditions. We can see an intensity-modulation image in the image plane of the volume phase mask. The intensity distribution of the image of the volume phase mask is inverse from the one of input amplitude mask. It can be explained by waveguide theory. Volume phase mask can be used to get modulated amplitude pattern by modulating the phase of incident light. It has the advantage of low energy loss over amplitude mask and real-time. Our method is very simple. It can be used to fabricate many kinds of complex phase masks and phase components used in optical information processing and Integrated Optics.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haidong Wen, Simin Liu, Xinzheng Zhang, Ru Guo, Guoquan Zhang, Qian Sun, Jingjun Xu, and Guangyin Zhang "Photorefractive phase mask", Proc. SPIE 4277, Integrated Optics Devices V, (15 May 2001);


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