Paper
9 July 2001 Novel RiS-type InGaN MQW laser diodes on FIELO GaN substrates
Masaru Kuramoto, Akitaka Kimura, Chiaki Sasaoka, Takahiro Arakida, Masaaki Nido, Masashi Mizuta
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Abstract
A novel ridge structure fabricated by selective-area epitaxial growth is proposed for InGaN MQW laser diodes (LDS). This technique is capable of precisely controlling the active ridge width and height, thus enabling stable single transverse-mode operation. Together with a backside n-contact on a low-dislocation-density GaN substrate, this structure provides high productivity and performance for GaN-based blue-violet LDs. The LDs fabricated by this technique have achieved continuous-wave operation at more than 30 mW up to a temperature of 90 degrees C, with a characteristic temperature T0 of 105 K from 20 to 90 degrees C. The laser design and characteristics are discussed in detail.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaru Kuramoto, Akitaka Kimura, Chiaki Sasaoka, Takahiro Arakida, Masaaki Nido, and Masashi Mizuta "Novel RiS-type InGaN MQW laser diodes on FIELO GaN substrates", Proc. SPIE 4283, Physics and Simulation of Optoelectronic Devices IX, (9 July 2001); https://doi.org/10.1117/12.432599
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Cited by 2 scholarly publications.
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KEYWORDS
Gallium nitride

Semiconductor lasers

Indium gallium nitride

Continuous wave operation

Pulsed laser operation

Refractive index

Scanning electron microscopy

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