Paper
12 June 2001 Avalanche multiplication noise in bulk and thin AI(x)Ga(1-x)As (x=0-0.8) PIN and NIP diodes
Beng Koon Ng, John P. R. David, Chee Hing Tan, S. A. Plimmer, Graham J. Rees, Richard C. Tozer, Mark Hopkinson
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Abstract
The avalanche multiplication noise characteristics of AlxGa1-xAs (x equals 0-0.8) have been measured in a wide range of PIN and NIP diodes. The study includes determining the effect of the alloy fraction, x, as it varies from 0 to 0.8 while the effect of the avalanche width, w, is investigated by varying it from 1 micrometers down to 0.05 micrometers . For x equals 0-0.6, the ratio of the electron to hole ionization coefficients, 1/k, decreases from 3 (for x equals 0) to 1 (for x equals 0.6), leading to higher noise in a local prediction as x increases. Measurements for x equals 0-0.6 in nominally 1um thick diodes indicates that the excess noise factor can be approximately predicted by the local model. However, as the avalanche width reduces, a lower than expected noise factor was measured. This behaviour is associated with the effect of deadspace, whereby carriers have insufficient energy to initiate ionization for a significant region of the device. The presence of deadspace leads to a more deterministic process, which acts to reduce excess noise. For x equals 0.8 however, its 1/k value is surprisingly high in a bulk structure, leading to noise performance that is primarily determined by the 1/k value and is comparable to that of silicon. Similar to the results of thin AlxGa1-xAs (x equals 0-0.6) diodes, thinner Al0.8Ga0.2As structures exhibit excess noise factor that is significantly reduced by the nonlocal deadspace effects.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Beng Koon Ng, John P. R. David, Chee Hing Tan, S. A. Plimmer, Graham J. Rees, Richard C. Tozer, and Mark Hopkinson "Avalanche multiplication noise in bulk and thin AI(x)Ga(1-x)As (x=0-0.8) PIN and NIP diodes", Proc. SPIE 4288, Photodetectors: Materials and Devices VI, (12 June 2001); https://doi.org/10.1117/12.429437
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KEYWORDS
Aluminum

Gallium

Diodes

PIN photodiodes

Ionization

Gallium arsenide

Solids

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