16 April 2001 Multilevel nanoscale DOE optimization, fabrication, and replication
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Abstract
In this paper, we employ a wavelet-based electromagnetic optimization algorithm to enhance multilevel diffractive lens performance. As we show in this paper, the optimized performance and iteration time is very much a function of the initial lens profile. To demonstrate this we analyze various types of initial profiles ranging from scalar-based lenses to flat and random structures. Additionally, we characterize the performance of replicated multilevel lenses fabricated using a soft lithographic technique known as nanoimprint lithography ( NIL) . Experimentalresults are presented.
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Dennis W. Prather, David Pustai, Marion R. LeCompte, Shouyuan Shi, "Multilevel nanoscale DOE optimization, fabrication, and replication", Proc. SPIE 4291, Diffractive and Holographic Technologies for Integrated Photonic Systems, (16 April 2001); doi: 10.1117/12.424854; https://doi.org/10.1117/12.424854
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