Strong yellow electroluminescence from manganese-silicon-implanted silicon-dioxide layers

Sergey Novikov; Victor F. Ovchinnikov; Jaakko Haerkoenen; Juha A.T. Sinkkonen

doi:10.1117/12.426935

18 May 2001 Strong yellow electroluminescence from manganese-silicon-implanted silicon-dioxide layers

Sergey Novikov, Victor F. Ovchinnikov, Jaakko Haerkoenen, Juha A.T. Sinkkonen

Proceedings Volume 4293, Silicon-based and Hybrid Optoelectronics III; (2001) https://doi.org/10.1117/12.426935
Event: Symposium on Integrated Optics, 2001, San Jose, CA, United States

Abstract

Room temperature (RT) electroluminescence (EL) was obtained for the first time from Mn enriched Si/SiO₂ structure. Si⁺ or Ar⁺ stimulated knock-on implantation through 20 nm Mn film with the subsequent annealing was used for EL device fabrication. Devices exhibit bright emission band at the 2.06 eV. The position does neither depend on implanted ion dose nor annealing procedure. EL is visible by naked eye even at current density as low as 1.5x10^-6 Acm^-2. Continuous wave external quantum efficiency 1.1x10^-3 and power efficiency 1.5x10^-5 have been achieved.

Citation Download Citation

Sergey Novikov, Victor F. Ovchinnikov, Jaakko Haerkoenen, and Juha A.T. Sinkkonen "Strong yellow electroluminescence from manganese-silicon-implanted silicon-dioxide layers", Proc. SPIE 4293, Silicon-based and Hybrid Optoelectronics III, (18 May 2001); https://doi.org/10.1117/12.426935

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