Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors

John GuoDung Su; Pamela Rae Patterson; Ming C. Wu

doi:10.1117/12.426942

18 May 2001 Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors

John GuoDung Su, Pamela Rae Patterson, Ming C. Wu

Proceedings Volume 4293, Silicon-based and Hybrid Optoelectronics III; (2001) https://doi.org/10.1117/12.426942
Event: Symposium on Integrated Optics, 2001, San Jose, CA, United States

Abstract

We have developed a novel wafer-scale single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined 2D scanners. The electrostatically actuated 2D scanner has a mirror area of 450 micrometers x 450 micrometers and an optical scan angle of +/- ±7.5 degree(s). Compared to micromirrors made with a standard polysilicon surface-micromachining process, the radius of curvature of the micromirror has been improved by 1 50 times from 1.8 cm to 265 cm, with surface roughness < 10 nm. Besides, single-crystalline honeycomb micromirrors derived from silicon on insulator (SOI) have been developed to reduce the mass of the bonded mirror.

Citation Download Citation

John GuoDung Su, Pamela Rae Patterson, and Ming C. Wu "Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors", Proc. SPIE 4293, Silicon-based and Hybrid Optoelectronics III, (18 May 2001); https://doi.org/10.1117/12.426942

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