Advances in graft polymerization lithography

Colin J. Brodsky; Brian C. Trinque; Heather F. Johnson; C. Grant Willson

doi:10.1117/12.436660

20 August 2001 Advances in graft polymerization lithography

Colin J. Brodsky, Brian C. Trinque, Heather F. Johnson, C. Grant Willson

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436660
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

New microlithography patterning technologies must be developed in order to meet the demands of advanced semiconductor manufacturing. This paper describes the development of a new top surface imaging technique that is designed to circumvent the difficulties associated with developing next generation single layer resists. Graft polymerization lithography is an extension of top surface imaging in which exposure creates an acidic surface that activates monomer deposition on top of the base layer. Silicon-containing monomers were synthesized in order to meet the graft polymerization process requirements. A QCM-monitored deposition system was developed to study the fundamental behavior of the deposition process as a function of temperature, pressure, and photoacid generator (PAG) loading. Volumetric, bulk polymer sorption measurements were used to provide insight into the critical sorption behavior that drives the deposition process. These fundamental studies led to a proposed process mechanism that explains the experimentally observed behavior. Finally, proof of concept imaging experiments were conducted that demonstrate the graft polymerization process through all lithographic steps.

Citation Download Citation

Colin J. Brodsky, Brian C. Trinque, Heather F. Johnson, and C. Grant Willson "Advances in graft polymerization lithography", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436660

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